1989 Photomicrography Competition

Melted ureum and dimethylbenzenesulfonic acid

Lars Bech

Location
Deurne, The Netherlands
Technique
Polarized Light
Magnification
40x

Structure of 1 megabite integrated circuit

Karl Deckart

Location
Eckental, Germany
Technique
Differential Interference Contrast
Magnification
40x

Micro vapor deposition on glass surface covered with an optical coating

George Watchmaker

Affiliation
Lawrence Livermore National Laboratory
Livermore, California, USA
Technique
Darkfield
Magnification
100x